AJA Orion 8 UHV Sputter Deposition

Applications

This AJA UHV sputtering system will be used across multiple focus areas but is uniquely designed for projects related to quantum science, e.g. Josephson Junctions deposition, hot sputtering for refractory metal superconductor films (Ta, Nb) and deposition of nitride films for magnetic field-compatible superinductance.

Capabilities

Load lock (4”wafers)
5 DC sputter guns with 2 inch targets
Off-Axis magnetron sputtering source.
4 power supplies
- Two 300 Watt RF generators, (1 for pre cleaning of the substrate, 1 for deposition)
- One standard DC power supply
- One pulsed DC generator
Ion source for substrate prep REACTIVE PROCESS GASSES - for reactive sputtering

Estimated Arrival

March 2025

Projected Availability

May 2025