Plasma-Therm MDS 100 Singulator

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Applications

Able to etch through Silicon wafers with ~1.5um of photoresist all the way to the edge of the wafer.

Capabilities
  • Deep silicon etch for wafer dicing
  • RF 300W generator & amu match for ETCH
  • Heated Chamber Lid and Upper Chamber Liners
  • Cold Mode Protection Ring
  • Fluid-cooled / electrically-heated etch lower electrode
  • 200 mm wafers down to small chips as well as non-traditional chip designs
  • Electrostatic clamping
  • Dual gas pods, one to supply the chamber and one to supply the gas ring
Estimated Arrival
April 2025
Projected Availability
June 2025