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Applications
XeF2 vapor delivery is designed for isotropic etching with extreme selectivity to several mask materials.
Capabilities
High-temperature chamber will allow for processing of an extended library of materials. NbN will be the first process established. Etch NbN under AlN using XeF2.
Estimated Arrival
XeF2 will be shipped on March 7th 2025
Projected Availability
May 2025